The Global Ytterbium Sputtering Target Market was valued at USD 28.4 Billion in 2021. The market is projected to grow USD 37.2 Billion in 2030, at a CAGR of 5.2%. A sputtering target is a substance used in the technique of sputter deposition, also known as thin film deposition. In a vacuum or inert-gas atmosphere, arc-melting or radio-frequency melting of a metal mixture can easily make multielement alloy sputtering targets.